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Mentor Blogs

Posts tagged with 'IC Design'

10 Jun, 2014
IC Design

Goooaaaaaaaaaaaaal!

Posted by Shelly Stalnaker

Shelly Stalnaker The World Cup is here! Every four years, the culmination of hundreds of qualifying matches around the world brings the best national teams together for nearly a month of intense competition to determine the world champion football team (Sorry, USA, but it’s football everywhere else). New national uniforms are unveiled, shoe companies vie to sponsor the best players and teams with their most advanced … Read More

IC Verification, ic manufacturing, Mentor Graphics, DRC, DRM, Design Rules, Foundry, process flow, IC Design, Fabless

13 May, 2014

Shelly Stalnaker With the advent of advanced process nodes, IC design teams have an increasing ability to pack more functionality and performance into state-of-the art SoCs. At the same time, every new node transition brings a flood of new design challenges that can severely impact design performance, power, and time-to-market. The introduction of multi-patterning, FinFET devices, complex DRC/DFM requirements, increased … Read More

P&R, Olympus-SoC, place and route, 16nm, 20nm, 10nm, IC Design, Multi-Patterning, double patterning, FinFET

8 May, 2014

Shelly Stalnaker Remember learning your colors in kindergarten? Learning how to debug color assignment errors in multi-patterning can sometimes seem just as confusing. In Take Two of the Tech Talk videos on multi-patterning, David Abercrombie continues his discussion with Brian Bailey of Semiconductor Engineering about color assignment issues, and possible corrective actions. More often than not, a color assignment … Read More

David Abercrombie, design debugging, Calibre, IC Verification, Multi-Patterning, double patterning, IC Design

7 May, 2014
IC Design

Sinkhole or Springboard?

Posted by Shelly Stalnaker

Shelly Stalnaker Depending on how well your company implements it, verification can be a quagmire that slows down your design delivery and creates frustration and conflict between teams, or a springboard that lets you deliver high-quality designs ahead of your competition. In a recent interview with Pradeep Chakraborty, our CEO, Wally Rhines, discusses the intricacies of design verification today, the biggest verification … Read More

Semiconductors, Mentor Graphics, SoC, 16 nm, 20nm, 14nm, Walden C. Rhines, IC Design, Wally Rhines, IC Verification, design verification

21 Mar, 2014
IC Manufacturing

I See the Light!

Posted by Shelly Stalnaker

Shelly Stalnaker Photonics technology isn’t new, by any means, but what is new is the drive to leverage high-volume silicon-based semiconductor manufacturing foundries and processes to build chips that can create, sense, modulate, and transmit light. So says Michael White in his latest SiliconEdge column on Electronic Design. The biggest challenge in applying CMOS foundry processes to silicon photonics is creating … Read More

Foundry, IC Design, silicon photonics, waveguides, ic manufacturing, Michael White

19 Mar, 2014
IC Design

Déjà Vu All Over Again

Posted by Shelly Stalnaker

Shelly Stalnaker Trailblazers, followers, and stragglers…semiconductor companies have usually always sorted themselves out along these lines. At 20nm, though ,we’re beginning to see a shift in these classifications that is affecting both technology node adoption and market strategy. Only a few companies are moving to nodes at 20nm and below, while many of the typical followers have decided to stay at 28nm … Read More

Foundry, IC Design, 14nm, 16nm, 10nm, advanced node, leading-edge, Semiconductor, Christen Decoin, 20nm, technology node, 28nm

18 Mar, 2014
IC Design

Old Faithful

Posted by Shelly Stalnaker

Shelly Stalnaker While unpredictability may account for the lure of gambling, reliability is an essential part of our everyday lives. Yellowstone National Park, which sits above the Yellowstone Caldera, contains half of the world’s geothermal features. Among the most famous is Old Faithful, a huge geyser that erupts at regular intervals. One reason tourists flock from all over the world to this park is that they know … Read More

IC Design, IC Verification, 16nm, 20nm, 10nm, circuit, PERC, Reliability, electrical, 45nm, Verification, Calibre

14 Mar, 2014
IC Manufacturing

Are You ECO-Friendly?

Posted by Shelly Stalnaker

Shelly Stalnaker Every designer dreads the last-minute engineering change order, or ECO. Just when you think you’re done…you’re not. At 45nm and below, ECOs get even more difficult to implement, because fill now has a direct impact on design performance. A small re-routing can get complicated very quickly with the complex fill requirements of advanced nodes. Fortunately, help is available! On Semiconductor … Read More

P&R, Jeff Wilson, place and route, 45nm, 20nm, IC Design, smart fill, ic manufacturing, DRC, ECO fill

3 Mar, 2014

Shelly Stalnaker David Abercrombie recently met with Brian Bailey of Semiconductor Engineering to explain many of the concepts and issues of multi-patterning that he has been writing about for the last couple of years. If you want to understand the basics of multi-patterning requirements, 12 minutes is all you need to check out their first video: Tech Talk: Multipatterning on semiengineering.com. If the video piques … Read More

double patterning, EUV, 20nm, Multi-Patterning, triple patterning, IC Design, ic manufacturing

19 Feb, 2014

Shelly Stalnaker The terms vector and vectorless modes are commonly used in the context of dynamic power grid (PG) analysis, but what do these terms mean? The PG dynamic simulator uses a design’s activity suite to compute the voltages and currents in the PG network. In vector mode, typically referred as a value change dump (VCD), logic simulation is used to generate the complete activity suite. In vectorless mode, the … Read More

IC Design, IC Verification, dynamic power grid analysis, vcd, vectorless verification, power grid analysis, value change dump

14 Feb, 2014
IC Design

Variability is EVERYWHERE!

Posted by Shelly Stalnaker

Shelly Stalnaker At advanced nodes, variability issues lurk behind every design mode, power state, process condition, and manufacturing step. Yet designers must find a way to balance the optimization of multiple operational modes and design corners against the aggressive performance and power targets demanded by today’s fast-moving markets. Concurrent analysis and optimization during place and route operations can provide … Read More

place and route, design corners, IC Design, concurrent analysis, Olympus-SoC, P&R, IC Verification, mcmm

29 Jan, 2014

Shelly Stalnaker Download the latest version of our guide to multi-patterning design and debugging, containing links to all of David Abercrombie’s detailed educational articles on SemiEngineering.com, along with links for complementary reference and learning options. Whether you are already working on designs with multi-patterning requirements, or just beginning multi-patterning work, you will benefit from David’s … Read More

triple patterning, double patterning, IC Design, Debugging, Physical Verification, SADP, ic manufacturing, Multi-Patterning

15 Jan, 2014

Shelly Stalnaker What’s coming in 2014? What new challenges await? Are you ready? Get a heads-up on some of the trends and events of the next 12 months with two articles. First, if you’re contemplating, or already working on, 2.5D and 3D ICs, you should take a look at 3D IC Design: Outlook for 2014 on 3D InCites. Written by Joseph Sawicki, this article can help you prepare for your 3D IC implementations. … Read More

Design for Manufacturing, Calibre, Design Rule Checking, 14nm, IC Design, 16nm, IC Verification, MEMs, 10nm, Physical Verification, 3D-IC, DRC, 3DIC, FinFET, 2.5D, Foundry, 20nm

15 Jan, 2014

Shelly Stalnaker DRC- and DFM-clean designs can still have hundreds to thousands of violations that must be debugged and corrected. How? Why? Mismatches between a router’s simplified tech file and the complete (and complex) signoff design rule decks at advanced nodes are generating significant numbers of DRC/DFM errors that can wreak havoc on your tapeout schedules. In particular, we’re seeing greater visibility … Read More

tech file, tapeout, DRC, Design Rule Checking, P&R, signoff, IC Design, IC Verification

20 Nov, 2009
IC Design

IBM Addresses Leakage

Posted by David Abercrombie

David Abercrombie

In case you missed the webinar by Jim Culp on November 3rd, I wanted to give you an opportunity to see what you missed. Jim is a Senior Engineer in IBM’s Advanced Physical Design and Technology Integration team. He is leading a team in the development of Parametric DFM and the mitigation of Circuit Limited Yield (CLY). During the webinar he discussed how CLY is becoming the leading contributor to yield

Read More

Physical Verification, DRC, Leakage, IC Design, Design Quality, IC Verification, Design for Manufacturing

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