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Posts tagged with 'OPC'

3 Mar, 2014
IC Manufacturing

EUV...Ready or Not?

Posted by Shelly Stalnaker

Shelly Stalnaker The semiconductor industry can (and does) argue about when extreme ultraviolet lithography will be ready for production. However, the actual dates are irrelevant to those engineers who must prepare OPC tools and processes for the EUV-specific effects that will have to be managed in manufacturing. They are busy now, evaluating the impact of such challenges as the distortion caused by EUV shadowing. In … Read More

SRAF, scanner, EUV shadowing, extreme ultraviolet, EUV, mask, OPC, ic manufacturing, Lithography

5 Apr, 2013

Gene Forte Optical lithography is not dead yet! 193nm immersion lithography will be used for the 20/22nm node, and with the continued delay of EUV, is now the plan of record for 14nm. Gandharv Bhatara explains how new OPC technology solves both the CD and turn-around time at very the edges of advanced node manufacturability. Read More … Read More

SRAF, RET, 20nm, 22 nm, 14nm, manufacturability, OPC, Foundry, Lithography

22 Jan, 2011
IC Design

Dawn at the OASIS

Posted by Joe Davis

Joe Davis Almost 10 years ago, as the industry was starting to adopt model-based OPC and other resolution enhancing techniques on a large scale, the ITRS got out its looking glass and saw an “explosion” in the size of the files used to describe chip layouts. As a result, a group of industry companies collaborated to create a SEMI spec for the OASIS format for layout data. The format was officially … Read More

diffusion of innovation, GDSII, Adoption, RET, tape-out, OASIS, OPC

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