Mentor Graphics Shatters Traditional Definition of Design to Manufacturing Handoff with Calibre nmDRC; Part of New Calibre nm Platform
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WILSONVILLE, Ore., July, 10, 2006 - Mentor Graphics Corporation (Nasdaq: MENT) today announced the immediate availability of the Calibre® nmDRC tool, which redefines the traditional design rule checking (DRC) step by dramatically reducing total cycle time and integrating critical elements such as critical area analysis and critical feature identification, all required to solve the yield challenges of the nanometer era. Calibre nmDRC is part of a new platform from Mentor, the Calibre nm Platform. This platform signals a major shift in the way the EDA industry addresses the complexity of nanometer design. The Evolution of Traditional DRC
“We've seen outstanding results with the new Hyperscaling technology in Calibre nmDRC,” said Kun-Cheng Wu, Design Development Director of Faraday Technology. “With our current designs targeting at 90nm and 130nm, compared with the original version, we found the new Hyperscaling performs more efficiently by speeding up DRC run times up to 5x. With the trend for bigger and more complex designs, it is critical to reduce physical verification run time, so we really appreciate Mentor’s efforts in introducing the well-performed Hyperscaling in Calibre nmDRC.” “We’re so excited about the Calibre nmDRC launch as it redefines the very nature of physical verification. The reception from customers during Calibre nmDRC’s broad beta period has simply been ‘wow’,” said Joe Sawicki, vice president and general manager of the Design-to-Silicon division at Mentor Graphics. “While it is common wisdom in the industry that all innovation comes from the start-ups, Calibre is the rare exception to that rule. Calibre has defined innovation, first by delivering the only DFM tools integrated into a common platform with Calibre YieldAnalyzer, Caliber YieldEnhancer, and Calibre Litho Friendly Design tools, and now with Calibre nmDRC.” The Sub-65nm Challenge To ensure high yields when using nanometer process technology, designers require new information and new levels of judgment that go beyond design rule checking to yield analysis. They need new ways to assess the quality of their designs in light of the more complex process constraints and larger process variations they now face. They need new ways to see the impact these constraints and variations have on the quality of their designs. Finally, they need a new kind of work environment that allows them to understand which of these effects is the most important to address during the process of improving design quality. Mentor's answer to this substantial change in the requirements for design signoff is the Calibre nm Platform. About Calibre nm Platform “As the industry moves toward 65nm and 45nm, the number and complexity of rules are exploding and a new approach to DRC is needed to ensure designs conform to manufacturing requirements in order to deliver acceptable yields,” said Yee-Hwee Phuan, director of Tapeout Operations at Chartered Semiconductor Manufacturing Ltd. “There is an enormous increase in the number of details that must be considered prior to tapeout, and our experience with the Calibre nm Platform is that it takes salient issues into consideration, while making the tool user as efficient as possible.” At its core, the Calibre nm Platform delivers exceptional value due to intrinsic characteristics of the underlying architecture.
Sonia Harrison Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.
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