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Mentor Graphics Delivers Essential New Capabilities in TSMC Analog/Mixed Signal Reference Flow 2.0

WILSONVILLE, Ore., June 2, 2011 - Mentor Graphics Corporation (NASDAQ: MENT) today announced that a collection of tools have been validated for inclusion in TSMC Analog/Mixed-signal Reference Flow 2.0 (AMS Reference Flow 2.0), providing design enablement for TSMC 28nm process technology. Areas of collaboration produced new capabilities to ensure device reliability, provide early access to design and verification data and deliver faster simulation results.

“We are pleased that Mentor tools that have been incorporated into our AMS Reference Flow 2.0,” said Suk Lee, director of Design Infrastructure Marketing at TSMC. “The capabilities provided by Mentor enhance the functionalities of TSMC 28nm design infrastructure and ensure that our mutual customers are able to create high performance designs that take full advantage of TSMC’s process.”

The Calibre® PERC tool enables automated electrical rule checking and circuit verification to ensure designs meet requirements in the area of analog layout guidelines. In the TSMC AMS Reference Flow 2.0, Mentor worked with TSMC to integrate the Calibre PERC tool and the Eldo® Classic Spice simulation tool to provide advanced circuit reliability checking. By combining topological and layout circuit verification with dynamic simulation, users can identify whether circuit layout patterns induce potential reliability concerns.

The Calibre xACT 3D parasitic extraction tool delivers field solver level accuracy with the performance of a rule-based solution. For the TSMC AMS Reference Flow 2.0, the Calibre xACT 3D parasitic extraction tool adds support for early access to parasitic information through the RCX-API for real-time calculation of wire loads.
Enhancements to the IC Station® platform and the Eldo Classic Spice simulation tool enable designers to have statistical results with faster simulation and less computing. Enhancements include fast Monte-Carlo simulation, re-simulation without reloading the entire netlist, Layout Dependent Effects (LDE) assessment and wireload parasitics assessment during pre-layout simulation.

The Calibre nmDRC and nmLVS tools are also part of the TSMC AMS Reference Flow 2.0. Moreover, the Calibre platform is the physical verification platform used to validate TSMC PDKs (Process Design Kits), which provide the models used in the TSMC AMS Reference Flow 2.0.

“As AMS designs continue their move to advanced nodes, it is critical that designers have an accurate and reliable simulation and verification environment that helps ensure their products meet specs,” said Walden C. Rhines, chairman and CEO, Mentor Graphics. “Our expertise in this area makes our products key elements of the TSMC AMS Reference Flow 2.0.”

About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $915 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.

(Mentor Graphics, Eldo, Calibre and IC Station are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)

For more information, please contact:
Carole Dunn
Mentor Graphics
503.685.4716
carole_dunn@mentor.com

Sonia Harrison
Mentor Graphics
503.685.1165
sonia_harrison@mentor.com

 
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