IC Nanometer Design

Next-generation place and route system that concurrently addresses variations in lithography, process corners and design modes.

The industry's first IC implementation solution that comprehensively addresses the performance, capacity, time-to-market, and variability challenges occurring at the 65nm and 45nm process nodes.

Next Generation High Performance RET Technology.

New Hyperscaling processing architecture produces best-in-class DRC run times with scalability to 100 CPUs.