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Editing in place from top-level in Calibre DESIGNrev

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Using Visualize and Merge Fill and Design Data in Calibre DESIGNrev

Visualizing the impact of fill in some critical areas prior to merging with the design database can help designers identify any concerns and make last minute adjustments before the data is combined. The...…View Technology Overview

Linking multiple windows for panning & zooming in Calibre DESIGNrev

It is easier to visualize the differences between layout databases by having each database open in different windows and compare those side by side. DESIGNrev can help you to synchronize multiple windows,...…View Technology Overview

Recording and exchanging chip viewing locations in Calibre DESIGNrev

This video shows user how to us clip function in DESIGNrev to record and share review locations between coworkers.…View Technology Overview

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Pattern Matching: Blueprints for Further Success

White Paper: Design patterns have a wide variety of applications in the design, verification and test flows of IC development. From significantly reducing rule deck complexity to simplifying the task of avoiding known...…View White Paper

Calibre Advanced Topics: Double Patterning

Training Course: Starting with the 20nm processing node, the use of two masks to print a single layer becomes a requirement because of lithography issues. This course will help you understand the impact of double patterning...…View Training course

Calibre Fundamentals: DESIGNrev

Training Course: This course will teach you to analyze, compare, and manipulate layout data using Calibre DESIGNrev, Calibre’s state-of-the-art layout viewer.…View Training course

 
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