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IC Manufacturing Blog

25 Aug, 2014

Shelly Stalnaker Are you stressed out over the effects of stress in your IC designs? Relaaaax…help is here! A new publication on mechanical stress in ICs, co-edited by Valeriy Sukharev, Principal Engineer for Calibre R&D, has just been released by AIP Publishing. Stress-Induced Phenomena and Reliability in 3D Microelectronics includes papers from international workshops held in the U.S., Germany, and Japan. … Read More

18 Aug, 2014

Testing the Boundaries of Good Design

Posted by Shelly Stalnaker

Shelly Stalnaker In a SPIE.TV interview, Joseph Sawicki, Vice-President and General Manager of the Design to Silicon division of Mentor Graphics, explains the challenges of moving from design abstraction to physical implementation to a successful yield. “Design to silicon” is a complex process that continuously blends evolutionary trends, such as enhancements to 3D mask design and yield learning, with more … Read More

14 Aug, 2014

Shelly Stalnaker Design-style-based (systematic) defects are the major challenge to yield ramp at advanced process nodes, adding to the complexity of the basic process ramp. Because of its involvement in the design, manufacturing, and test, EDA is in a unique position to contribute toward the control, if not the solution, of this problem, through the use of automated pattern detection and analysis. Patterns can be useful … Read More

7 Aug, 2014

Failing to Succeed

Posted by Shelly Stalnaker

Shelly Stalnaker Failure analysis is a critical process in successful IC production. No matter how comprehensive the design rules are, no matter how thorough the verification strategies are, there will be chip failures in production. Understanding the cause of these failures is crucial to being able to implement design strategies and corrective technology to ensure the failures are eliminated in future designs. At its … Read More

22 Jul, 2014

Global Warming

Posted by Shelly Stalnaker

Shelly Stalnaker If you’re designing large die such as a system-on-chip (SoC) with high power demands, you’d better be thinking about how to get the heat out. Poor heat dissipation can lead to a sub-optimal packaging solution from cost, size, weight and performance perspectives. Historically, designers assumed the die temperature was uniform. Not any more. Heating due to current leakage makes power dissipation … Read More

21 Jul, 2014

Won't You Please, Please Help Me?

Posted by Shelly Stalnaker

Shelly Stalnaker No, that’s not really a cry for help, at least not from me. But I can imagine a lot of designers saying just that as they try to understand and implement multi-patterning requirements. LELE? LELELE? LELELELE? SADP? SADP SIT? Whhaaaatttt???!!! And help we have. In spades. Our resident multi-patterning expert, David Abercrombie, not only writes extensively about multi-patterning issues, but he is … Read More

21 Mar, 2014

I See the Light!

Posted by Shelly Stalnaker

Shelly Stalnaker Photonics technology isn’t new, by any means, but what is new is the drive to leverage high-volume silicon-based semiconductor manufacturing foundries and processes to build chips that can create, sense, modulate, and transmit light. So says Michael White in his latest SiliconEdge column on Electronic Design. The biggest challenge in applying CMOS foundry processes to silicon photonics is creating … Read More

Foundry, IC Design, silicon photonics, waveguides, ic manufacturing, Michael White

14 Mar, 2014

Are You ECO-Friendly?

Posted by Shelly Stalnaker

Shelly Stalnaker Every designer dreads the last-minute engineering change order, or ECO. Just when you think you’re done…you’re not. At 45nm and below, ECOs get even more difficult to implement, because fill now has a direct impact on design performance. A small re-routing can get complicated very quickly with the complex fill requirements of advanced nodes. Fortunately, help is available! On Semiconductor … Read More

P&R, Jeff Wilson, place and route, 45nm, 20nm, IC Design, smart fill, ic manufacturing, DRC, ECO fill

3 Mar, 2014

EUV...Ready or Not?

Posted by Shelly Stalnaker

Shelly Stalnaker The semiconductor industry can (and does) argue about when extreme ultraviolet lithography will be ready for production. However, the actual dates are irrelevant to those engineers who must prepare OPC tools and processes for the EUV-specific effects that will have to be managed in manufacturing. They are busy now, evaluating the impact of such challenges as the distortion caused by EUV shadowing. In … Read More

SRAF, scanner, EUV shadowing, extreme ultraviolet, EUV, mask, OPC, ic manufacturing, Lithography

3 Mar, 2014

Lights! Camera! Multi-Patterning!

Posted by Shelly Stalnaker

Shelly Stalnaker David Abercrombie recently met with Brian Bailey of Semiconductor Engineering to explain many of the concepts and issues of multi-patterning that he has been writing about for the last couple of years. If you want to understand the basics of multi-patterning requirements, 12 minutes is all you need to check out their first video: Tech Talk: Multipatterning on semiengineering.com. If the video piques … Read More

double patterning, EUV, 20nm, Multi-Patterning, triple patterning, IC Design, ic manufacturing

13 Feb, 2014

I SPIE, with my little eye...

Posted by Shelly Stalnaker

Shelly Stalnaker Are you attending the SPIE Advanced Lithography conference beginning Feb 23rd? If so, you’ll want to take note of the following Mentor presentations…there’s something for everyone. For detailed abstracts, go to the SPIE Technical Summaries document. Feb 25, 4:40pm: Feasibility of compensating for EUV field edge effects through OPC Feb 25, 5:20pm: Pattern fidelity verification for logic design in EUV … Read More

29 Jan, 2014

UPDATE: Multi-Patterning Unmasked!!

Posted by Shelly Stalnaker

Shelly Stalnaker Download the latest version of our guide to multi-patterning design and debugging, containing links to all of David Abercrombie’s detailed educational articles on SemiEngineering.com, along with links for complementary reference and learning options. Whether you are already working on designs with multi-patterning requirements, or just beginning multi-patterning work, you will benefit from David’s … Read More

triple patterning, double patterning, IC Design, Debugging, Physical Verification, SADP, ic manufacturing, Multi-Patterning

21 Jan, 2014

Shelly Stalnaker Foundries, both pure-play and independent device manufacturers (IDM), rigorously compete for market share. One factor that helps them get and keep business is turnaround time (TAT). Until recently, companies could reduce TAT by adding computer hardware, fine-tuning OPC recipes, improving input hierarchical handling of designs, and upgrading to new software versions with new functionality and performance … Read More

cluster management, Fabless, Calibre CalCM, resource management, turnaround time, Foundry, ic manufacturing

 
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