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EUV...Ready or Not?

The semiconductor industry can (and does) argue about when extreme ultraviolet lithography will be ready for production. However, the actual dates are irrelevant to those engineers who must prepare OPC tools and processes for the EUV-specific effects that will have to be managed in manufacturing. They are busy now, evaluating the impact of such challenges as the distortion caused by EUV shadowing. In the January edition of Solid State Technology, Fan Jiang takes an in-depth look at this EUV effect, and the model-based solution that has been developed to resolve the resultant imaging errors.

SRAF, scanner, EUV shadowing, extreme ultraviolet, EUV, mask, OPC, ic manufacturing, Lithography

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About Shelly Stalnaker

Shelly StalnakerI believe in the well-written sentence, the eye-catching title, and the satisfaction of hearing someone say, “Now I get it.” I believe there ought to be a constitutional amendment outlawing the use of the passive tense in technical writing. I believe a writer can explain and entertain at the same time, and I believe that everyone, even in the business world, has a story to tell. Visit Foundry Solutions

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