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I SPIE, with my little eye...

Are you attending the SPIE Advanced Lithography conference beginning Feb 23rd? If so, you’ll want to take note of the following Mentor presentations…there’s something for everyone. For detailed abstracts, go to the SPIE Technical Summaries document.

Feb 25, 4:40pm: Feasibility of compensating for EUV field edge effects through OPC

Feb 25, 5:20pm: Pattern fidelity verification for logic design in EUV lithography

Feb 26, 9:40am: Model-based OPC using the MEEF matrix II

Feb 26, 2:10pm: Model-based multilayers fix for litho-hotspots beyond 20nm node

Feb 27, 11:05am: Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk

Feb 27, 2:35pm: Physical verification and manufacturing of contact/via layers using graphoepitaxy DSA processes

Feb 27, 4:05pm: Automated fill modification to support late-stage design change

We’ll also be presenting a number of posters:

Feb 24: Bringing SEM-contour based OPC to production

Feb 25: Resist toploss modeling for OPC applications

Feb 26: Work smarter not harder: How to get more results with less modeling

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About Shelly Stalnaker

Shelly StalnakerI believe in the well-written sentence, the eye-catching title, and the satisfaction of hearing someone say, “Now I get it.” I believe there ought to be a constitutional amendment outlawing the use of the passive tense in technical writing. I believe a writer can explain and entertain at the same time, and I believe that everyone, even in the business world, has a story to tell. Visit Foundry Solutions

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