Sign In
Forgot Password?
Sign In | | Create Account

IC Manufacturing Blog

Posts tagged with 'EUV'

3 Mar, 2014

EUV...Ready or Not?

Posted by Shelly Stalnaker

Shelly Stalnaker The semiconductor industry can (and does) argue about when extreme ultraviolet lithography will be ready for production. However, the actual dates are irrelevant to those engineers who must prepare OPC tools and processes for the EUV-specific effects that will have to be managed in manufacturing. They are busy now, evaluating the impact of such challenges as the distortion caused by EUV shadowing. In … Read More

SRAF, scanner, EUV shadowing, extreme ultraviolet, EUV, mask, OPC, ic manufacturing, Lithography

3 Mar, 2014

Lights! Camera! Multi-Patterning!

Posted by Shelly Stalnaker

Shelly Stalnaker David Abercrombie recently met with Brian Bailey of Semiconductor Engineering to explain many of the concepts and issues of multi-patterning that he has been writing about for the last couple of years. If you want to understand the basics of multi-patterning requirements, 12 minutes is all you need to check out their first video: Tech Talk: Multipatterning on semiengineering.com. If the video piques … Read More

double patterning, EUV, 20nm, Multi-Patterning, triple patterning, IC Design, ic manufacturing

 
Online Chat