Calibre® nmOPC is the third-generation optical proximity correction (OPC) tool that expands the Calibre arsenal of resolution enhancement technology (RET) products for sub-65 nanometer (nm) process technologies. The Calibre nmOPC tool and the companion OPC verification tool, Calibre OPCverify™, usher in a new era of computational lithography by delivering superior simulation accuracy with the highest performance and lowest cost of ownership in the industry.
The Calibre nmOPC tool offers best-in-class accuracy, speed, and cost of ownership. Like all Calibre family products, Calibre nmOPC runs on the fully integrated Calibre hierarchical geometry engine uniquely enabling a fully integrated design to mask flow with a unified command language. Calibre nmOPC also supports the OASIS output format to minimize output file size. Streamlined hierarchical processing algorithm in Calibre nmOPC enables the tool to take advantage of natural design hierarchy to improve turn around time, computational efficiency, and throughput compared to flat processing tools.
To find out more about how Calibre nmOPC can improve your IC manufacturing results while lowering costs, click on the links to additional support materials available on this website.
Features and Benefits
- Choice of both sparse and dense simulation, selectable on a layer-by-layer basis
- Process window optimized OPC
- Hybrid computing platform utilizing co-processor acceleration
- Compact resist modeling capability
- Design-intent aware correction algorithms
Virtual manufacturing solution supports RET recipe optimization.