Calibre® OPCpro™ provides full-chip optical and process correction of complex IC layouts to increase yield and process latitude. Working with batch-oriented flows, Calibre OPCpro makes changes to a layout to compensate for lithography distortions inherent in the deep submicron manufacturing process.
Calibre OPCpro supports a mix of rule and simulation-based correction and simulates the results of correction using optical and process models developed from measured manufacturing process characteristics. Both OPCpro and nmOPC include the ability to correct phase-shifted layouts, including attenuated and alternatinve PSM for gates.
High-performance Resolution Enhancement Technology for advanced IC manufacturing processes.