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Calibre OPCpro

Calibre® OPCpro™ provides full-chip optical and process correction of complex IC layouts to increase yield and process latitude. Working with batch-oriented flows, Calibre OPCpro makes changes to a layout to compensate for lithography distortions inherent in the deep submicron manufacturing process.

Calibre OPCpro supports a mix of rule and simulation-based correction and simulates the results of correction using optical and process models developed from measured manufacturing process characteristics. Both OPCpro and nmOPC include the ability to correct phase-shifted layouts, including attenuated and alternatinve PSM for gates.

Related Product

Calibre nmOPC

Calibre nmOPC is the third-generation optical proximity correction (OPC) tool that expands the Calibre arsenal of resolution enhancement technology (RET) products for sub-65 nanometer (nm) process technologies. Learn More

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