Calibre Mask Data Preparation

Mentor's Mask Data Preparation (MDP) solution is fully compatible with the Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversion tasks in one mask fabrication batch run using a single control language.

Calibre MDP provides:

  • Layer derivation
  • Mirroring
  • Scaling
  • Rotation
  • Planarization fill
  • Global and selective sizing
  • Hierarchical mask rule checking (MRC)
  • Mask proximity correction (MPC)
  • Mask fracturing into many standard output formats

Mask Data Preparation (MDP)

Technology Overview: Calibre® MDP Product Manager, Steffen Schulze, describes how new challenges in mask making at advanced IC nodes are being met with new Calibre solutions, including fracturing and mask verification tools,... View Technology Overview

Calibre MDP provides direct output for the leading mask writer formats in the sub-wavelength era, such as MEBES, JEOL, Micronic, and Variable-Shaped-Beam, in addition to standard GDSII.

Products

Datasheet

Toolbox

Calibre Training

We have training courses available for Calibre products in our training centers around the world, online, or at your site.

Contact Mentor Graphics