Mask Data Preparation - Calibre®
Mentor's Mask Data Preparation (MDP) solution is fully compatible with the Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversion tasks in one mask fabrication batch run using a single control language.
Calibre MDP provides:
- Layer derivation
- Mirroring
- Scaling
- Rotation
- Planarization fill
- Global and selective sizing
- Hierarchical mask rule checking (MRC)
- Mask proximity correction (MPC)
- Mask fracturing into many standard output formats
Mask Data Preparation (MDP)
Technology Overview: Calibre MDP Product Manager, Steffen Schulze, describes how new challenges in mask making at advanced IC nodes are being met with new Calibre solutions, including fracturing and mask verification tools,... View Technology Overview
Calibre MDP provides direct output for the leading mask writer formats in the sub-wavelength era, such as MEBES, JEOL, Micronic, and Variable-Shaped-Beam, in addition to standard GDSII.
Products
- Calibre FRACTURE™Mask fracturing and data export.
- Calibre MDPmerge™Assembles VSB11 job decks for complete chips.
- Calibre MDPverify™Accurate verification of mask writer files against GDSII.
- Calibre MDPview™Visual verification of mask data.
- Calibre® MAPI™A programming API for the rapid development of mask metrology applications.
- Calibre® MASKOPT™Post-OPC optimization to reduce mask shot count.
Datasheets
- Calibre MDP: Mask Data Preparation (PDF, 322kb)
Toolbox
- TECHPUB: Experimental Result and Simulation Analysis for the use of Pixelated Illumination from Source Mask Optimization for 22nm Logic Lithography Process
- TECHPUB: Compute Resource Management and Tat Control in Mask Data Preparation
- TECHPUB: A User-Programmable Link between Data Preparation and Mask Manufacturing Equipment
- TECHPUB: AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
Contact Mentor Graphics
- Request Information or call toll free: 1-800-547-3000