Calibre Mask Data Preparation
Mentor's Mask Data Preparation (MDP) solution is fully compatible with the Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversion tasks in one mask fabrication batch run using a single control language.
Calibre MDP provides:
- Layer derivation
- Planarization fill
- Global and selective sizing
- Hierarchical mask rule checking (MRC)
- Mask proximity correction (MPC)
- Mask fracturing into many standard output formats
Calibre MDP provides direct output for the leading mask writer formats in the sub-wavelength era, such as MEBES, JEOL, Micronic, and Variable-Shaped-Beam, in addition to standard GDSII.
Mask fracturing and data export.
Assembles VSB11 job decks for complete chips.
Accurate verification of mask writer files against GDSII.
Visual verification of mask data.
A programming API for the rapid development of mask metrology applications.
Post-OPC optimization to reduce mask shot count.