Calibre MPCpro

Calibre® MPCpro is a solution for systematic errors introduced by e-beam lithography and mask etching processes built on Calibre OPCpro™ technology for optical process correction. Calibre MPCpro corrects process effects like fogging, development and etch loading, and ebeam proximity effects.

Related Product

Datasheet

Improving the CD Linearity and Proximity Performance of Photomasks Written on the Sigma7500-II DUV Laser Writer Through Embedded OPC(PDF, 773kb)

Advanced Mask Process Modeling for 45-nm and 32-nm Nodes(PDF, 270kb)

Model Based Mask Process Correction and Verification for Advanced Process Nodes(PDF, 243kb)

Calibre Training

We have training courses available for Calibre products in our training centers around the world, online, or at your site.

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