Calibre® MPCpro is a solution for systematic errors introduced by e-beam lithography and mask etching processes built on Calibre OPCpro™ technology for optical process correction. Calibre MPCpro corrects process effects like fogging, development and etch loading, and ebeam proximity effects.
Calibre OPCpro provides full-chip optical and process correction of complex IC layouts to increase yield and process latitude. Working with batch-oriented flows, Calibre OPCpro makes changes to a layout to compensate for lithography distortions inherent in the deep submicron manufacturing process. Learn More
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