Calibre MPCpro
Calibre® MPCpro is a solution for systematic errors introduced by e-beam lithography and mask etching processes built on Calibre OPCpro™ technology for optical process correction. Calibre MPCpro corrects process effects like fogging, development and etch loading, and ebeam proximity effects.
Related Product
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Calibre OPCpro™
Full-chip correction increases yield and process latitude.
Datasheet
Toolbox
- White Paper: Improving the CD Linearity and Proximity Performance of Photomasks Written on the Sigma7500-II DUV Laser Writer Through Embedded OPC
- White Paper: Advanced Mask Process Modeling for 45-nm and 32-nm Nodes
- White Paper: Model Based Mask Process Correction and Verification for Advanced Process Nodes
Contact Mentor Graphics
- Calibre MPCpro Info Request or call toll free: 1-800-547-3000