Calibre® Mask Process Correction (MPC) provides optimizations specifically developed for e-beam mask writers. New correction and modeling capabilities improve mask CD linearity and uniformity for advanced nodes, especially for smaller feature sizes (such as SRAFs).
Calibre nmMPC handles long, medium and short range effects with a combination of density-based bias models and variable etch bias (VEB) calibrated models based on physical mask measurements. Calibre nmMPC also includes tools for mask model building and customization that are integrated with Calibre WORKbench.
Solution for accurate tool setup - Calibre WORKbench