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Leading the way to 22nm

Description: Mentor Graphics is committed to being your computational lithography solution provider for 22nm and beyond. Learn how now.



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Technology Overview Select Video
Mask Data Preparation (MDP)

Description: Calibre® MDP Product Manager, Steffen Schulze, describes how new challenges in mask making at advanced IC nodes are being met with new Calibre solutions, including fracturing and mask verification tools,...

Design Tasks: Calibre Mask Data Preparation
Products: Calibre MDPmerge™ , Calibre MDPverify™

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Technology Overview Select Video
Fastest Time-to-Mask With The Calibre Platform

Description: Fastest Time-to-Mask With The Calibre Platform.

Design Tasks: Calibre Mask Data Preparation , Calibre Mask Process Correction
Products: Calibre MPCpro

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Product Demo Select Video
Executive Brief: Meeting the Critical Challenges of IC Implementation

Description: At the 2008 Design Automation Conference in June, Joseph Sawicki, vice president and general manager of the Design to Silicon Division, laid out Mentor’s strategy to help customers with the challenges...

Design Tasks: Calibre Mask Data Preparation , Calibre Computational Lithography , Calibre Mask Process Correction

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On-demand Web Seminar Select Video
Showing: 1-4 of 4 total resources
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