IC Manufacturing News & Industry Articles

Nov 23, 2011

Mar 1, 2011

New Shanghai HuaLi Foundry Chooses the Mentor Graphics Calibre RET Solution for 65/45nm Development and Production (Feb 28, 2011)
Mentor Graphics Design-to-Silicon Solutions Implemented as Part of Samsung Electronics’ New 32nm High-K Metal Gate Offering (Jun 11, 2010)
Freescale Semiconductor Collaborates with Mentor Graphics on Tessent Silicon Test, Yield Analysis, Calibre Physical Verification and DFM (Jan 11, 2010)
GLOBALFOUNDRIES Selects Mentor Graphics Calibre Platform for Computational Lithography and DFM Enablement (Oct 16, 2009)
Mentor Graphics and Applied Materials Deploy OASIS.MASK Open Data Standard for Higher Efficiency Mask Manufacturing (Sep 14, 2009)
Mentor Graphics Eldo Simulator used by STMicroelectronics to Characterize 32nm Cell Libraries (Mar 5, 2009)
Mentor Graphics Olympus P&R and Calibre Verification Platforms Qualified for 32nm IC Designs at STMicroelectronics (Mar 2, 2009)
Selete Selects Mentor Graphics Calibre nm Platform for EUV Flare Compensation (Feb 27, 2009)

Cutting the Key to 14nm Lithography (Apr 8, 2013)
Weighing the Design Requirements for 22nm Lithography (Jan 15, 2010)
Taming the runaway computational demands of advanced lithography (Jan 12, 2010)
Connecting design and fabrication (Dec 3, 2008)
Interview with J. Sturtevant: Computational Lithography (Nov 3, 2008)
Manufacturable Source Mask Optimization (Nov 3, 2008)
Computational Lithography Technology Trends for 32nm (Sep 1, 2008)
TSMC Adopts Mentor Graphics Eldo Analog Simulation Tool - EDA Geek News (Aug 12, 2008)
Accelerating Both Sparse and Dense OPC Simulation (Aug 7, 2008)
Two keys that unlock 45nm OPC (May 1, 2008)
Articles Archives