IC Manufacturing News Archive
December 2006
Cypress Adopts Mentor Graphics Calibre xRC For Parasitic Extraction; Cites “Unparalleled Accuracy”
Mentor Graphics Calibre xRC and Calibre xL Tools Validated for TSMC 65 Nanometer Process Technology
November 2006
Mentor Graphics provides TSMC-qualified process design kit for 0.13 micron mixed-mode and RF design
Mentor Graphics Releases Next-Generation OPC Solution
September 2006
Mentor Graphics Announces New Benchmark for First Year Product Success with Calibre OPCverify
Agere Systems’ Storage Division Readies for 65 Nanometers with Adoption of Mentor Graphics Calibre
August 2006
Haier IC Adopts Mentor Graphics Eldo Simulator as the Standard Tool for Analog Circuit Design
Mentor Graphics to Deliver Select EDA Technologies To Freescale Semiconductor
Mentor Graphics to Deliver Select EDA Technologies To Freescale Semiconductor
July 2006
Mentor Graphics Calibre nmDRC Supports the AMD Opteron Processor
Mentor Graphics Calibre nmDRC Adopted by UMC to Address Shifting Requirements for Sign-off
TSMC Qualifies Mentor Graphics Calibre nmDRC on 65nm Process
Mentor Graphics CEO to Moderate Panel at the Design Automation Conference
Mentor Graphics Integrates the Newly Acquired ADiT Fast-SPICE Technology with ADVance MS
May 2006
Mentor Graphics Calibre Platform Provides Integrated DFM Flow for TSMC 65nm Technologies
March 2006
February 2006
Mentor Graphics Calibre Mask Data Preparation Ready for 45nm
January 2006
MediaTek Adopts Mentor Graphics Eldo for their Library Characterization
Faraday Adopts Mentor Graphics Eldo as their Internal SPICE Simulator
Mentor Graphics Next Generation OPC Technology Ensures Yield Across Manufacturing Process Window