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IC Manufacturing News Archive

December 2007

Mentor Graphics Announces Industry’s First Multi-mode Multi-corner Signal Integrity Solution for 65/45nm Dec 10, 2007

November 2007

Mentor Graphics Olympus-SoC Place and Route System used by STMicroelectronics to Tape Out Set-Top Box Chip Nov 27, 2007

Mentor Graphics and TSMC Collaborate to Release 65 nanometer RF Design Kits Nov 13, 2007

June 2007

Mentor Graphics Acquires Sierra Design Automation; Answers Industry Need for Design-to-Fab Flow for 65 and 45 Nanometers Jun 11, 2007

Mentor Graphics Collaborates with TSMC to Provide Advanced DFM Capabilities in Reference Flow 8.0 Jun 5, 2007

Mentor Graphics Collaborates with TSMC to Provide Advanced DFM Capabilities in Reference Flow 8.0 Jun 5, 2007

Mentor Graphics’ DFM Solution Qualified by Common Platform Technology Alliance for 45nm and 65nm Jun 4, 2007

May 2007

Chartered and Mentor Graphics Team to Offer Technology Design Kits for 65 and 90 Nanometer Common Platform Technology Processes May 31, 2007

Benefits of Mentor Graphics’ Calibre LFD Demonstrated by Infineon-Chartered Collaboration May 30, 2007

Mentor Graphics and UMC Deliver Analog Mixed-Signal Reference Flow May 23, 2007

Mentor Graphics and Fujitsu Collaborate to Provide Calibre LFD Solution for Fujitsu’s Internal and Fabless Customers May 22, 2007

UMC Expands Support for Mentor Graphics’ Calibre YieldAnalyzer to Deliver Production Proven DFM Flow May 15, 2007

March 2007

Mentor Graphics Customers Reap Success with ADVance MS Mixed-Signal Verification Platform Mar 1, 2007

January 2007

STARC Standardizes on Calibre YieldAnalyzer as Reference Tool in DFM Flow for Critical Area Extraction Jan 24, 2007

 
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