IC Manufacturing News Archive

December 2008

Mentor Graphics Olympus-SoC Place-and-Route System Qualifies for TSMC 40nm Processes Dec 11, 2008

November 2008

Mentor Graphics Boosts Eldo Simulator Performance with Generalized Multi-threading Technology Nov 4, 2008

October 2008

Mentor Graphics Olympus-SoC Place-and-Route System Slashes Design Closure Times with Industry’s First Parallel Timing Analysis and Optimization Technology Oct 13, 2008

TSMC Adopts Mentor Graphics Calibre Equation-Based DRC Feature for Advanced Physical Verification Oct 7, 2008

September 2008

IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for the Integrated Circuit Industry Sep 17, 2008

August 2008

Mentor Graphics Eldo Adopted by TSMC for Cell Library Characterization of 40 Nanometer Technology Node Aug 12, 2008

July 2008

Mentor Consulting Slashes Time-to-Mask at Dongbu HiTek with Optimized Calibre Flow Jul 22, 2008

Mentor Graphics' Calibre nmOPC Product Wins SI Editors’ Choice Best Product Award Jul 9, 2008

June 2008

Mentor Graphics Outlines IC Implementation Strategy to Address Sub-45nm Challenges Jun 9, 2008

May 2008

Mentor Graphics Qualifies Calibre Model-based Planarity Flow for TSMC’s 65 and 40 nanometer IC Manufacturing Processes May 29, 2008

Mentor Graphics Calibre LFD selected by STMicroelectronics for Litho Variability Analysis at 65 and 45 Nanometers May 23, 2008

Toshiba Selects Mentor Graphics Calibre DFM Platform for its Device Extraction Flow May 19, 2008

Mentor Graphics Acquires Assets of Ponte Solutions—Technology to be Integrated into Calibre DFM Solutions May 15, 2008

Mentor Graphics Aligns Product Groups to Address IC Implementation Challenges at 45nm and Beyond May 7, 2008

Mentor Graphics Aligns Product Groups to Address IC Implementation Challenges at 45nm and Beyond May 7, 2008

April 2008

Mentor Graphics Aligns with UMC to Validate the Accuracy of Calibre nmDRC Physical Verification UMC 65nm Deck Apr 29, 2008

March 2008

STARC Establishes Variation-and-Yield-Aware Design Methodology using Mentor Graphics Calibre LFD Mar 26, 2008

February 2008

Mentor Graphics Calibre nmOPC on Cell/B.E. Platform Qualified for Production at IBM Feb 26, 2008