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Mentor Graphics Qualifies Calibre Model-based Planarity Flow for TSMC’s 65 and 40 nanometer IC Manufacturing Processes

WILSONVILLE, Ore., May 29, 2008 – Mentor Graphics Corporation (Nasdaq: MENT) today announced that its SmartFill model-based planarity flow has been qualified for TSMC’s 65 and 40 nanometer (nm) processes. By reducing metal thickness variability, model based metal filling can help improve systematic and parametric yield. The SmartFill flow integrates the Calibre® CMPAnalyzer and YieldEnhancer facilities, and TSMC’s DFM (design for manufacturing) data kit (DDK). The SmartFill qualification is a continuation of the DFM between Mentor Graphics and TSMC under TSMC’s Active Accuracy Assurance (AAA) program.

“Making the best use of foundry data in an accurate and consistent manner with EDA partners is a goal of our AAA initiative. We envision further collaboration with Mentor Graphics as AAA expands to capture more of advanced process technologies’ inherent value,” said S.T. Juang, Sr. Director of Design Infrastructure Marketing, TSMC.

The Calibre CMPAnalyzer tool is the foundation of the Mentor CMP solution. CMPAnalyzer is directly linked with VCMP, TSMC’s CMP simulator, to provide 3-D hotspot detection and to determine an optimum filling strategy. CMPAnalyzer then passes the appropriate information to the SmartFill function of the Calibre YieldEnhancer tool, which adds the fill elements directly into the layout design database. The combination of accurate foundry data and intelligent fill analysis improves parametric yield by reducing thickness variation that affects resistance while minimizing the capacitance added to the design. CMPAnalyzer also generates thickness values that can be incorporated into the Calibre xRC™ tool for more accurate parasitic extraction. CMPAnalyzer and YieldEnhancer are built on the Calibre nm Platform, the industry’s leading physical verification platform known for delivering best-in-class performance, accuracy, and reliability.

“As we move beyond 65nm, tight linkages between EDA tools and manufacturing processes becomes more and more critical,” said Joseph Sawicki, vice president and general manager, Design to Silicon Division, Mentor Graphics. “With CAA, litho process checking, and CMP tools qualified at TSMC, the Calibre physical verification platform provides a comprehensive approach to yield management at advanced process nodes.”

About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $850 million and employs approximately 4,200 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.

(Mentor Graphics and Calibre are registered trademarks and xRC is a trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)

For more information, please contact:
Gene Forte
Mentor Graphics
503.685.1193
gene_forte@mentor.com

Sonia Harrison
Mentor Graphics
503.685.1165
sonia_harrison@mentor.com

 
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