Products A to Z - IC Manufacturing

Calibre FRACTURE™

Mask fracturing and data export.

Assembles VSB11 job decks for complete chips.

Accurate verification of mask writer files against GDSII.

Visual verification of mask data.

Mask process correction for process loading and proximity effects.

Dedicated optimizations for e-beam mask writers.

High-performance Resolution Enhancement Technology for advanced IC manufacturing processes.

Full-chip correction increases yield and process latitude.

Full support for adding, simulating and verifying scattering bars.

Virtual manufacturing solution supports RET recipe optimization.

Solution for accurate tool setup - Calibre WORKbench

A programming API for the rapid development of mask metrology applications.

Post-OPC optimization to reduce mask shot count.