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Mask data preparation flow for advanced technology nodes
The trend to reduce critical features dimension has dramatically increased design file size. Design tape–out flows at the 28 nm technology node handle post-OPC data files that reach hundreds of gigabytes....
Roadmap to sub-nanometer OPC model accuracy
White PaperRoadmap to sub-nanometer OPC model accuracy
OPC models describe the entire patterning process, including photomask, optics, resist, and etch as a set of separately characterized modules. It is difficult, however, to definitively calibrate the optics...
Weighting evaluation for improving OPC model quality by using advanced SEM-Contours from wafer and mask
In this study, the weighing function of Calibre ContourCal, was evaluated using a familiar OPC data set used in previous published research. We discuss the quality of OPC model by applying different weighting...