A User-Programmable Link between Data Preparation and Mask Manufacturing Equipment
White Paper
ABSTRACT
In order to fully exploit the design knowledge during the operation of mask manufacturing equipment, as well as to enable the efficient feedback of manufacturing information upstream into the design chain, close communication links between the data processing domain and the machine are necessary. With shrinking design rules and modeling technology required to drive simulations and corrections, the amount and variety of measurements, for example, is steadily growing. This requires a flexible and automated setup of parameters and location information and their communication with the machine. The paper will describe a programming interface based on the Tcl/Tk language that contains a set of frequently reoccurring functions for data extraction and search, site characterization, site filtering, and coordinate transfer. It enables the free programming of the links, adapting to the flow and the machine needs. The interface lowers the effort to connect to new tools with specific measurement capabilities, and it reduces the setup and measurement time. The interface is capable of handling all common mask writer formats and their jobdecks, as well as OASIS and GDSII data. The application of this interface is demonstrated for the Carl Zeiss AIMSTM system.
Related Resources
Mask data preparation flow for advanced technology nodes
The trend to reduce critical features dimension has dramatically increased design file size. Design tape–out flows at the 28 nm technology node handle post-OPC data files that reach hundreds of gigabytes....
Double Patterning from Design Enablement to Verification
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges...
Reducing shot count through Optimization based fracture
The increasing complexity of RET solutions with each new process node has increased the shot count of advanced photomasks. In particular, the introduction of inverse lithography masks represents a significant...