Accelerate OPC convergence with new iteration control methodology
White Paper
ABSTRACT
A dilemmatic trade-off that all OPC engineers are facing everyday is the convergence of the OPC result and the control of the OPC iteration times. Theoretically, infinite times of OPC iterations are needed to achieve a convergent and stable correction result. But actually there should always be a cut-off for the iteration time, for turnaround- time is always an important criteria for IC fabs. But considering the design layout becomes more complicated and pattern density becomes higher with the shrinkage of the critical dimension, fragmentation control during the OPC procedure is also becoming more and more sophisticated. Thus, to achieve a convergent correction result for all OPC fragments within limited correction iteration times now becomes a big challenge to OPC engineers. This work presents our study in a new OPC iteration control methodology. It can help to find an algorithm that always converges, and reduce the excessive use of parameter setting, commands and other involvement by the user. With this, we can reduce the run time required to obtain a convergent OPC solution.
Related Resources
Can fast Rule-Based Assist Feature Generation in random-logic Contact Layout provide sufficient Process Window?
Semiconductor manufacturing is continuously ramping up the yield of technology processes with transistor dimensions well below the exposure wave length. Light diraction eects limit the resolution of pattern...
Patterning Process Models Presentation
White PaperPatterning Process Models Presentation
This presentation reviews the steady improvement in the predictive power and runtime performance of the patterning models used in full chip simulation tools down to 14 nm node, as well as the factors that...
Model-Based Double-Dipole Lithography for Sub-30-nm Node Device
As the optical lithography advances into the sub-30nm technology node, the various candidates of lithography have been discussed. Double dipole lithography (DDL) has been a primary lithography candidate...
TAGS: DO-254