Model Based Mask Process Correction and Verification for Advanced Process Nodes
Model-Based Mask Process Correction and Verification for Advanced Process Nodes
Residual errors in photomasks have triggered development work for correcting mask manufacturing effects. Long range and short range effects contribute to the observed signatures. The dominating error source...
Advanced Mask Process Modeling for 45-nm and 32-nm Nodes
As tolerance requirements for the lithography process continue to shrink with each new technology node, the contributions of all process sequence steps to the critical dimension error budgets are being...
Fastest Time-to-Mask With The Calibre Platform
Fastest Time-to-Mask With The Calibre Platform.