IC Nanometer Design

Technical Events:

• Mixed-Signal Design Capture and Simulation within Mentor's Custom-IC Flow May 15, 2008 - San Jose, CA
• AAA and Advanced DFM—Collaboration for Success May 28, 2008 - San Jose, CA
• EDA Tech Forum May 7, 2008 - Austin, TX

Technical Publications:

• Exposure Tool Specific Post-OPC Verification
• Highly Reliable Detection and Correction of Pinched Areas for High Transmission Phase Shift Mask
• Optimized OPC Approach for Process Window Improvement

• Mentor Graphics Aligns with UMC to Validate the Accuracy of Calibre nmDRC Physical Verification UMC 65nm DeckApr 29, 2008
• Mentor Graphics Calibre nmOPC on Cell/B.E. Platform Qualified for Production at IBMFeb 26, 2008
• Mentor Graphics Announces Industry’s First Multi-mode Multi-corner Signal Integrity Solution for 65/45nmDec 10, 2007