IC Station SDL

  • Polygon editing functionality of ICgraph Basic, plus hierarchical, schematic-driven layout environment
  • Dynamic connectivity display with cross-probing Ready-to-use, parameterized device generators dramatically improve efficiency while creating DRC-compliant layouts for digital and analog design
  • Engineering Change Order (ECO) component quickly modifies the layout to reflect schematic-driven engineering changes
  • Enables layout designers to find potential shorts caused by overlapping nets before running LVS
  • Parameterized layout allows standardization across multiple users and sites

Benefits

  • Allows designers to create IC layouts based on information from a logic source
  • Makes navigation between the layout and schematic fast and easy

Press Release

TSMC Releases 65nm RF Process Design Kit

Mentor Graphics and TSMC Collaborate to Release 65 nanometer RF Design Kits

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