Posts tagged with '45nm'
TSMC and Mentor Graphics recently held a joint Marketing seminar (06/25/09) for mutual customers to go over the new DFM requirements at 45/40 nm. (In my first post, I mused about the implications of making some DFM analysis steps mandatory.) When the presentations at the seminar ended, and the Q&A began, two customers basically asked the same question, “What do you mean by mandatory?” Of course, TSMC … Read More
In my previous post about TSMC making some DFM analysis steps mandatory at 45nm, I ended with a question about why the foundries can't just write better design rules (and rule decks) to make sure all designs yield well. This is a topic that has been discussed elsewhere, but here's my take on it.
If we take a step back for a moment, there is something generic about DFM analysis that needs to be considered. … Read More
If you are a TSMC customer, no doubt you have heard that TSMC has announced that for 45nm (and presumably beyond), LPC and VCMP are mandatory for block/chip. What does this mean? It means that TSMC is requiring lithography and planarity analysis for all 45nm designs. Their website says customers can either run it themselves, or contract TSMC services to do it. The most cost-effective way would be for … Read More