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IC Design Blog

Posts tagged with 'D2S'

13 Dec, 2013

Shelly Stalnaker Just like blueprints give an architect a visual representation of a building, design patterns provide engineers with a visual depiction of complex layout geometries. Design patterns have become a useful tool throughout design, verification, and test processes. This Design-to-Silicon white paper explains how Calibre Pattern Matching software can help you implement automated pattern capture and pattern … Read More

pattern capture, Mentor Graphics, Pattern Matching, D2S, Design Rule Checking, Calibre Pattern Matching, SVRF, Foundry, hotspot detection, yield detractors, design waivers, DRC

13 Dec, 2013

Mastering the Magic of Multi-Patterning

Posted by Shelly Stalnaker

Shelly Stalnaker While processes like double and triple patterning may sometimes seem like magic, successfully implementing multi-patterning compliance in the IC design and verification flow requires a thorough understanding of multi-patterning techniques and their impact on your design. In this white paper from David Abercrombie, learn what multi-patterning is, why you need it, and how Calibre Multi-Patterning software … Read More

odd cycle, multipatterning, 16nm, Lithography, 20nm, mandrel, Mentor Graphics, Multi-Patterning, 14nm, colorless design, layout decomposition, D2S, LELE, anchor path, litho, Calibre Multi-Patterning, litho-etch-litho-etch, FinFET, double patterning, Foundry, warning rings, Parasitic Extraction, spacer-assisted, triple patterning, spacer is dielectric, spacer is mask, SID SADP, SIM SADP, pin coloring, pitch-split

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