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IC Design Blog

Posts tagged with 'Lithography'

13 Dec, 2013

Mastering the Magic of Multi-Patterning

Posted by Shelly Stalnaker

Shelly Stalnaker While processes like double and triple patterning may sometimes seem like magic, successfully implementing multi-patterning compliance in the IC design and verification flow requires a thorough understanding of multi-patterning techniques and their impact on your design. In this white paper from David Abercrombie, learn what multi-patterning is, why you need it, and how Calibre Multi-Patterning software … Read More

odd cycle, multipatterning, 16nm, Lithography, 20nm, mandrel, Mentor Graphics, Multi-Patterning, 14nm, colorless design, layout decomposition, D2S, LELE, anchor path, litho, Calibre Multi-Patterning, litho-etch-litho-etch, FinFET, double patterning, Foundry, warning rings, Parasitic Extraction, spacer-assisted, triple patterning, spacer is dielectric, spacer is mask, SID SADP, SIM SADP, pin coloring, pitch-split

5 Apr, 2013

The Secrets of 14nm Lithography

Posted by Gene Forte

Gene Forte Optical lithography is not dead yet! 193nm immersion lithography will be used for the 20/22nm node, and with the continued delay of EUV, is now the plan of record for 14nm. Gandharv Bhatara explains how new OPC technology solves both the CD and turn-around time at very the edges of advanced node manufacturability. Read More … Read More

SRAF, RET, 20nm, 22 nm, 14nm, manufacturability, OPC, Foundry, Lithography

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