Sign In
Forgot Password?
Sign In | | Create Account

IC Design Blog

Posts tagged with 'N20'

19 Mar, 2013

A New World for Fill at N20

Posted by admin

admin There are many major changes required to design, verify, and manufacture semiconductors at the 20nm process node (N20). One of these is fill. At previous design nodes, fill was used just to ensure manufacturability by giving each layer (metal, poly, diffusion) an accepted density. At N20, fill is used to address many more manufacturing issues, and has become highly complex. Read More … Read More

fill, 20nm, litho, N20

Tags

Archives

 
Online Chat