Calibre MDP

• Seamless extension of tape-out verification and RET into mask data generation.
• Supports optimum mask writer performance
• Allows for quick assessment of manufacturability of the design, preventing time-consuming stops in the mask making process
• Enables mask proximity correction (MPC) via rules based adjustments
• Allow for easy visual assessment and verification of the results

Benefits:

• Fast turn-around time and data volume containment helps manage mask cost
• Seamless integration in verification environments preserves the investment in EDA tools