Calibre® nmOPC is a third-generation optical proximity correction (OPC) tool that expands the Calibre arsenal of resolution enhancement technology (RET) products for sub-65 nanometer (nm) process technologies. The Calibre nmOPC tool and the companion OPC verification tool, Calibre OPCverify, usher in a new era of computational lithography by delivering superior simulation accuracy with the highest performance and lowest cost of ownership in the industry.
Low k1 photolithography processes are increasing the complexity of RET applications in nanometer designs. At 45nm, more complex models and through process window correction and verification requirements significantly increase computational burden. Both the lithographic challenges and the computational complexity associated with the 45nm process node create a need for advanced capabilities for computational lithography tools.
Calibre nmOPC answers this challenge by delivering several innovations including dense simulation, process window optimized OPC, a hybrid computing platform utilizing co-processor acceleration, a new compact resist modeling capability, and design-intent aware correction algorithms. The Calibre nmOPC tool offers best-in-class accuracy, speed, and cost of ownership. Like all Calibre family products, Calibre nmOPC and Calibre OPCverify run on the fully integrated Calibre hierarchical geometry engine uniquely enabling a fully integrated design to mask flow with a unified command language. Calibre nmOPC also supports the OASIS output format to minimize output file size. A new streamlined hierarchical processing algorithm in Calibre nmOPC enables the tool to take advantage of design hierarchy to improve turn around time, computational efficiency, and throughput compared to flat processing tools.
