Calibre OPCverify

  • Grid-based OPC simulation for 65nm and below
  • Shape-based check targets to printed image across process window
  • Extensive failure mode checks
  • Uses latest Calibre MTflex distributed processing capabilities
  • Support OPC recipe verification, mask sign-off, process window analysis/verification, litho-friendly design

Calibre OPCverify

 

Benefits

 
  • Single, accurate modeling foundation for all litho simulation
  • Improves systematic yield loss before manufacturing
  • Allows users to try varying RET recipes to determine best OPC score for manufacturing of design
  • Scalability assures necessary turn-around-time for mask operations
  • Does not require dedicated hardware; runs on all supported platforms
  • Supported by the Calibre platform hierarchical polygon processing engine
 
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