Calibre OPCverify
- Grid-based OPC simulation for 65nm and below
- Shape-based check targets to printed image across process window
- Extensive failure mode checks
- Uses latest Calibre MTflex distributed processing capabilities
- Support OPC recipe verification, mask sign-off, process window analysis/verification, litho-friendly design
Benefits
- Single, accurate modeling foundation for all litho simulation
- Improves systematic yield loss before manufacturing
- Allows users to try varying RET recipes to determine best OPC score for manufacturing of design
- Scalability assures necessary turn-around-time for mask operations
- Does not require dedicated hardware; runs on all supported platforms
- Supported by the Calibre platform hierarchical polygon processing engine