Calibre RET (OPC and PSM)
- Ensure accurate simulation and correction
- Minimizes data expansion with an advanced hierarchical database engine
- Fully integrated physical verification and RET technologies make it easy to upgrade an established flow from layout-to-silicon with next-generation technology
- Ensures that just the right amount of RET is applied for each run
Benefits
- 'Mask-friendly' OPC, PSM, and fracture format output minimizes mask costs and lowers overall write times
- Complete PSM solution enables layout of fast, small gate
Complementary products:
- Calibre OPCsbar – Scattering bars
- Calibre TDopc – Table-driven OPC
- Calibre PSMgate – Phase shift mask assignment for gates
- Calibre WORKbench – Environment for creating accurate process models and tested production-ready tool setup files
- Calibre LITHOview – subset of Calibre WORKbench
- Calibre Printimage – Simulated silicon print image
