- Ensure accurate simulation and correction
- Minimizes data expansion with an advanced hierarchical database engine
- Fully integrated physical verification and RET technologies make it easy to upgrade an established flow from layout-to-silicon with next-generation technology
- Ensures that just the right amount of RET is applied for each run
Benefits
- 'Mask-friendly' OPC, PSM, and fracture format output minimizes mask costs and lowers overall write times
- Complete PSM solution enables layout of fast, small gate
Complementary products:Calibre OPCsbar – Scattering bars Calibre TDopc – Table-driven OPC Calibre PSMgate – Phase shift mask assignment for gates Calibre WORKbench – Environment for creating accurate process models and tested production-ready tool setup files Calibre LITHOview – subset of Calibre WORKbench Calibre Printimage – Simulated silicon print image
Mentor Technology Viewpoint: RET/OPC
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