Calibre RET (OPC and PSM)

• Ensure accurate simulation and correction
• Minimizes data expansion with an advanced hierarchical database engine
• Fully integrated physical verification and RET technologies make it easy to upgrade an established flow from layout-to-silicon with next-generation technology
• Ensures that just the right amount of RET is applied for each run

• 'Mask-friendly' OPC, PSM, and fracture format output minimizes mask costs and lowers overall write times
• Complete PSM solution enables layout of fast, small gate

Complementary products:

• Calibre OPCsbar – Scattering bars
• Calibre TDopc – Table-driven OPC
• Calibre PSMgate – Phase shift mask assignment for gates
• Calibre WORKbench – Environment for creating accurate process models and tested production-ready tool setup files
• Calibre LITHOview – subset of Calibre WORKbench
• Calibre Printimage – Simulated silicon print image