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The Hitchhiker's Guide to Multi-Patterning

Technology Overview 58:41

The Hitchhiker's Guide to Multi-Patterning

Beginning at 20nm, the challenges of lithographic imaging require the use of double patterning. Does this mean designers will have to do twice as much work? What about those pesky cycle design rule errors?...

TAGS: DAC, double patterning, Lithography, Multi-Patterning

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DAC 2012 Expert Panel: Fasten Your Seatbelt—We're...

Technology Overview 34:07

Abstract

DAC 2012 Expert Panel: Fasten Your Seatbelt—We're Going to 14nm!

IC designs at 14nm will have new structures and new techniques that impact routing, design for manufacturing,...

TAGS: 14nm, DAC, Design for Manufacturing

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Why IC Designers Need New Double Patterning Debug...

Technology Overview 04:05

Abstract

Why IC Designers Need New Double Patterning Debug Capabilities at 20nm

Jean-Marie Brunet, Director of DFM Product Marketing, discusses Mentor's history of collaboration with TSMC and highlights their work on design enabling support for 20nm.