Beginning at 20nm, the challenges of lithographic imaging require the use of double patterning. Does this mean designers will have to do twice as much work? What about those pesky cycle design rule errors?...
TAGS: DAC, double patterning, Lithography, Multi-Patterning
IC designs at 14nm will have new structures and new techniques that impact routing, design for manufacturing,...
TAGS: 14nm, DAC, Design for Manufacturing
Jean-Marie Brunet, Director of DFM Product Marketing, discusses Mentor's history of collaboration with TSMC and highlights their work on design enabling support for 20nm.
TAGS: 20nm, double patterning
Interview with Mentor Graphics CEO Walden Rhines at DAC 2012.
TAGS: 20nm, 28nm, 3D IC, DAC
Interview with Mentor Graphics' Pravin Madhani at DAC 2012.
Interview with Mentor Graphics' Michael Buehler at DAC 2012.
Interview with Mentor Graphics' David Abercrombie at DAC 2012.
Interview with Mentor Graphics' Joe Sawicki at DAC 2012.
Interview with Mentor Graphics' Martin Vlach at DAC 2012.
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