As implementable analog circuit size has increased significantly due to advancements in manufacturing process, analog designers of system large scale integration (LSI) face increasingly difficult problems....
Traditional high frequency analysis (HFA) of integrated circuit designs is based on an empirical approach, which is slow and cumbersome. It is costly to develop the initial model for an IC process, and...
With the progress of technology nodes, circuit designers are now encountering challenging circuit reliability issues that have no simple solutions. Calibre PERC delivers fast, comprehensive and accurate...
With the continuous development of today’s technology, IC design becomes a more complex process. The designer now not only takes care of the normal design and layout parameters as usual, but also...
Semiconductor manufacturing is continuously ramping up the yield of technology processes with transistor dimensions well below the exposure wave length. Light di raction e ects limit the resolution of pattern...
In this work, we introduce the use of pattern matching as a potential solution for many verification flows problems. Pattern matching offers a great TAT advantage since it is a DRC based process, thus it...
This paper shares the details of the Yield Enhancements that were done at 28nm full chip level sharing the complexity involved in implementing such a flow and then the verification challenges involved ,...
As the technology advances, OPC run time turns to be a big concern and a great deal of our efforts is directed towards speeding up the LITHO operations. In addition, the OPC simulation consistency is sometimes...
As IC technologies shrink and via defects remain the same size, the probability of via defects increases. Redundant via insertion is an effective method to reduce yield loss related to via failures, but...
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