Calibre Advanced DRC: Getting Designs to Market Faster with Calibre Pattern Matching
DRC is seeing an explosion in design rule deck size and complexity, which is overwhelming designers. Many advanced DRC checks are difficult (if not impossible) to accurately code, and designers are experiencing increased verification runtimes and longer debug times. Pattern Matching is a radically new way to simplify design rule checks and improve productivity by allowing users to specify design rules graphically. Learn how the new Calibre Pattern Matching capabilities and Calibre nmDRC can improve your productivity and get your designs to market faster.
About the Presenter
Jonathan Muirhead is a Technical Marketing Engineer for DRC and Pattern Matching in the Design to Silicon Division of Mentor Graphics. He previously worked in Customer Support, also for Mentor Graphics. Mr. Muirhead received his B.Sc. in Computer Engineering from Washington State University.