IC Nanometer Design News & Industry Articles
Press Releases
- Mentor Graphics and Samsung Optimize 14nm Process Design Kits (May 31, 2013)
- Mentor Graphics and GLOBALFOUNDRIES Deliver 20nm Design Kits for Advanced Design Enablement (May 30, 2013)
- Mentor Graphics and TSMC Collaborate to Improve and Expand 20nm IC Physical Verification Offering (May 28, 2013)
- Mentor Graphics Design, and Verification Tools Certified for TSMC 16nm FinFET (May 28, 2013)
- Mentor Graphics Teams with OpSIS Foundries and Lumerical Solutions on PDK Development for IME Silicon Photonics Process (May 22, 2013)
- Mentor Graphics Pyxis Platform and PDK Automation Process Adopted by MagnaChip Semiconductor (May 14, 2013)
- Mentor Graphics Deep Submicron Division Launches the Kronos Cell Characterization and Analysis Platform (Feb 27, 2013)
- Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung’s 14nm IC Manufacturing Process (Dec 21, 2012)
Press Release Archives
Industry Articles
- For power and performance, Fins or BOXes (Apr 5, 2013)
- Rethinking communications: Automating tapeout review reporting (Apr 2, 2013)
- Voltage-Drop Analysis Technique Optimizes MTCMOS Cell Placement For Low-Power Designs (Mar 26, 2013)
- DFM Services in the Cloud (Feb 27, 2013)
- Optimizing autonomous IC test without sacrificing precision (Feb 26, 2013)
- A New World for Fill at N20 (Feb 21, 2013)
- Leakage Optimization (Feb 14, 2013)
- Hospital Privileges: Fixing DP Errors with Cutting and Stitching (Jan 31, 2013)
- Guidelines For Designing Multi-Voltage ICs (Jan 17, 2013)
- Make The Leap From Test Chips To Production Designs At 20 nm (Jan 4, 2013)
- Articles Archives