IC Nanometer Design News & Industry Articles

November 2008

NEC Electronics Selects Mentor Graphics Calibre nmLVS for Advanced Circuit Characterization at 40nm and Below Nov 13, 2008

Mentor Graphics Boosts Eldo Simulator Performance with Generalized Multi-threading Technology Nov 4, 2008

October 2008

Mentor Graphics Announces Nucleus Platform Media Player for Rapid Delivery of Multimedia Applications Oct 27, 2008

Mentor Graphics Olympus-SoC Place-and-Route System Slashes Design Closure Times with Industry’s First Parallel Timing Analysis and Optimization Technology Oct 13, 2008

TSMC Adopts Mentor Graphics Calibre Equation-Based DRC Feature for Advanced Physical Verification Oct 7, 2008

September 2008

IBM and Mentor Graphics to Develop 22nm Computational Lithography Solution for the Integrated Circuit Industry Sep 17, 2008

August 2008

Mentor Graphics Eldo Adopted by TSMC for Cell Library Characterization of 40 Nanometer Technology Node Aug 12, 2008

July 2008

Mentor Consulting Slashes Time-to-Mask at Dongbu HiTek with Optimized Calibre Flow Jul 22, 2008

June 2008

Mentor Graphics Outlines IC Implementation Strategy to Address Sub-45nm Challenges Jun 9, 2008

May 2008

Mentor Graphics Qualifies Calibre Model-based Planarity Flow for TSMC’s 65 and 40 nanometer IC Manufacturing Processes May 29, 2008

Mentor Graphics Calibre LFD selected by STMicroelectronics for Litho Variability Analysis at 65 and 45 Nanometers May 23, 2008

Toshiba Selects Mentor Graphics Calibre DFM Platform for its Device Extraction Flow May 19, 2008

Mentor Graphics Acquires Assets of Ponte Solutions—Technology to be Integrated into Calibre DFM Solutions May 15, 2008

Mentor Graphics Aligns Product Groups to Address IC Implementation Challenges at 45nm and Beyond May 7, 2008

April 2008

Mentor Graphics Aligns with UMC to Validate the Accuracy of Calibre nmDRC Physical Verification UMC 65nm Deck Apr 29, 2008

March 2008

STARC Establishes Variation-and-Yield-Aware Design Methodology using Mentor Graphics Calibre LFD Mar 26, 2008

February 2008

Mentor Graphics Calibre nmOPC on Cell/B.E. Platform Qualified for Production at IBM Feb 26, 2008

December 2007

Mentor Graphics Announces Industry’s First Multi-mode Multi-corner Signal Integrity Solution for 65/45nm Dec 10, 2007

November 2007

Mentor Graphics Olympus-SoC Place and Route System used by STMicroelectronics to Tape Out Set-Top Box Chip Nov 27, 2007

Mentor Graphics and TSMC Collaborate to Release 65 nanometer RF Design Kits Nov 13, 2007

June 2007

Mentor Graphics Acquires Sierra Design Automation; Answers Industry Need for Design-to-Fab Flow for 65 and 45 Nanometers Jun 11, 2007

Mentor Graphics Collaborates with TSMC to Provide Advanced DFM Capabilities in Reference Flow 8.0 Jun 5, 2007

Mentor Graphics’ DFM Solution Qualified by Common Platform Technology Alliance for 45nm and 65nm Jun 4, 2007

May 2007

Chartered and Mentor Graphics Team to Offer Technology Design Kits for 65 and 90 Nanometer Common Platform Technology Processes May 31, 2007

Benefits of Mentor Graphics’ Calibre LFD Demonstrated by Infineon-Chartered Collaboration May 30, 2007

Mentor Graphics and UMC Deliver Analog Mixed-Signal Reference Flow May 23, 2007

Mentor Graphics and Fujitsu Collaborate to Provide Calibre LFD Solution for Fujitsu’s Internal and Fabless Customers May 22, 2007

March 2007

Mentor Graphics Customers Reap Success with ADVance MS Mixed-Signal Verification Platform Mar 1, 2007

January 2007

STARC Standardizes on Calibre YieldAnalyzer as Reference Tool in DFM Flow for Critical Area Extraction Jan 24, 2007

December 2006

Cypress Adopts Mentor Graphics Calibre xRC For Parasitic Extraction; Cites “Unparalleled Accuracy” Dec 14, 2006

Mentor Graphics Calibre xRC and Calibre xL Tools Validated for TSMC 65 Nanometer Process Technology Dec 14, 2006

November 2006

Mentor Graphics provides TSMC-qualified process design kit for 0.13 micron mixed-mode and RF design Nov 30, 2006

Mentor Graphics Releases Next-Generation OPC Solution Nov 29, 2006

September 2006

Mentor Graphics Announces New Benchmark for First Year Product Success with Calibre OPCverify Sep 19, 2006

Mentor Graphics Calibre OPCverify Selected by Matsushita for Manufacturing Verification of Nanometer Technologies Sep 18, 2006

Agere Systems’ Storage Division Readies for 65 Nanometers with Adoption of Mentor Graphics Calibre Sep 12, 2006

Jazz Semiconductor and Mentor Graphics Release Comprehensive Design Kits for Analog/Mixed-Signal Integrated Circuit Design Flow Sep 5, 2006

August 2006

Haier IC Adopts Mentor Graphics Eldo Simulator as the Standard Tool for Analog Circuit Design Aug 23, 2006

Mentor Graphics to Deliver Select EDA Technologies To Freescale Semiconductor Aug 14, 2006

July 2006

Mentor Graphics Calibre nmDRC Delivers Superior Productivity on the Intel Dual-Core Xeon 5160 Processor Jul 27, 2006

Mentor Graphics Calibre nmDRC Supports the AMD Opteron Processor Jul 27, 2006

Mentor Graphics Calibre nmDRC Adopted by UMC to Address Shifting Requirements for Sign-off Jul 26, 2006

TSMC Qualifies Mentor Graphics Calibre nmDRC  on 65nm Process Jul 26, 2006

Mentor Graphics and ARM Validate Physical IP for Robustness to Lithographic Variation Using Calibre LFD Jul 26, 2006

Mentor Graphics CEO to Moderate Panel at the Design Automation Conference Jul 19, 2006

Mentor Graphics Integrates the Newly Acquired ADiT Fast-SPICE Technology with ADVance MS Jul 11, 2006

Mentor Graphics Shatters Traditional Definition of Design to Manufacturing Handoff with Calibre nmDRC; Part of New Calibre nm Platform Jul 10, 2006

May 2006

Mentor Graphics Calibre Platform Provides Integrated DFM Flow for TSMC 65nm Technologies May 17, 2006

Enuclia Standardizes on Mentor Graphics Calibre Platform for Physical Verification and Parasitic Extraction of its New DTV ASIC Designs May 12, 2006

March 2006

Mentor Graphics Calibre Tools Strengthen DFM Flow for IBM/Chartered/Samsung 65 nm Common Platform Technology Mar 30, 2006

Mentor Graphics Unveils New Calibre Litho-Friendly Design Product, Bringing Process Variability Data into the Design Flow Mar 6, 2006

January 2006

MediaTek Adopts Mentor Graphics Eldo for their Library Characterization Jan 13, 2006

Faraday Adopts Mentor Graphics Eldo as their Internal SPICE Simulator Jan 10, 2006

Mentor Graphics Next Generation OPC Technology Ensures Yield Across Manufacturing Process Window Jan 9, 2006

SMIC Adopts Mentor Graphics Eldo Simulator for Analog Circuits for its 0.13-micron and Below Process Nodes Jan 6, 2006

September 2005

Mentor Graphics Announces Product Certification for 64-Bit Red Hat Enterprise Linux Platform Sep 1, 2005

May 2005

Mentor Graphics CEO to Keynote SBC 2005 May 6, 2005

January 2005

TSMC Validates 90nm Process Technology with Mentor Graphics Calibre xRC Test Chip Program Jan 12, 2005

November 2004

Mentor Graphics Delivers Analog Mixed Simulator to NEC Electronics Nov 23, 2004

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