Enuclia Standardizes on Mentor Graphics Calibre Platform for Physical Verification and Parasitic Extraction of its New DTV ASIC Designs
"Complexity increase in nanometer geometries is challenging," said Carl Ruggiero, chief technology officer and co-founder of Enuclia. "We've added Calibre to our collection of tools for physical verification and parasitic extraction because its proven track record and decisive roadmap meet our stringent requirements for EDA tool innovation."
"The Calibre platform is known throughout the industry as a technology leader for the design-to-silicon handoff," added Todd Moyer, director of mixed signal engineering at Enuclia. "Calibre delivers value on all fronts: usability, foundry support, performance, scalability and functionality."
There are clear benefits when designers adopt a comprehensive physical verification flow using the market leading Calibre tool suite, which includes Calibre DRC (design rule check), Calibre LVS (layout vs. schematic), Calibre xRC (parasitic extraction), and Calibre RVE (results viewing environment), all accessible through the Calibre Interactive invocation graphical user interface (GUI). Designers can cross probe results, debug quickly and easily, and locate and fix errors in a succinct manner. In addition, with Calibre, the risk of unforeseen issues in manufacturing is greatly minimized because Calibre is the golden sign-off standard at the majority of all world-class foundries.
"The Calibre design-to-silicon platform is recognized for its technological superiority," said Joe Sawicki, vice president and general manager of the Design-to-Silicon division at Mentor Graphics. "When our customers adopt the Calibre tool flow, they find their total verification time is greatly reduced, they experience predictable, fast turn-around times and avoid delays in their design cycle."
About Mentor Graphics
Mentor Graphics Corporation (Nasdaq: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $700 million and employs approximately 4,000 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.
For more information, please contact:
Carole Thurman
Mentor Graphics
503.685.4716
carole_thurman@mentor.com
Sonia Harrison
Mentor Graphics
503.685.1165
sonia_harrison@mentor.com
IC Nanometer Design Press Releases
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- Mentor Graphics Deep Submicron Division Launches the Kronos Cell Characterization and Analysis Platform (Feb 27, 2013)
- Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung’s 14nm IC Manufacturing Process (Dec 21, 2012)
- Mentor Graphics Pyxis Platform Applauded by HP (Dec 19, 2012)
- Mentor Graphics Announces that ON Semiconductor Completed Multiple Successful Tapeouts Using Pyxis Custom Router (Nov 8, 2012)
- KALRAY Completes 256-processor, 28nm SoC Design Using Mentor Graphics Design and Test Tools (Oct 23, 2012)
- TSMC Presents Two Partner of the Year Awards to Mentor Graphics for 20nm and 3D IC Design Flows (Oct 16, 2012)
- Mentor Graphics Provides Design, Verification and Test Solutions for TSMC’s 20nm Design Infrastructure (Oct 15, 2012)
- Mentor Graphics Provides Design, Verification, Thermal and Test Solutions for TSMC’s CoWoS Reference Flow (Oct 15, 2012)
- Mentor Graphics Calibre LFD Signoff Litho Checking Tool Certified for TSMC 20nm Process (Sep 12, 2012)