Mentor Graphics Collaborates with GLOBALFOUNDRIES on Advanced Design and Manufacturing Flow Based on Calibre
WILSONVILLE, Ore., June 11, 2010—Mentor Graphics Corporation (NASDAQ: MENT) today announced that it is working with GLOBALFOUNDRIES to provide mutual customers with a reference flow that addresses the complex verification challenges of IC development at 28 nm and below. GLOBALFOUNDRIES’ proprietary Library of Yield Detractors Patterns and their innovative DRC+ physical verification flow are now implemented on Mentor’s Calibre® platform, which in addition to equation-based verification and comprehensive DFM, now includes pattern matching-based design rule checking capabilities for mutual customers, with support for GUI-based pattern creation and library management enabling custom rule development.
“By working closely with Mentor Graphics to combine our advanced foundry models and process data with Calibre’s signoff and DFM capabilities, GLOBALFOUNDRIES DRC+ flow provides our customers with the ability to more quickly release their design to fabrication,” said Andy Brotman, vice president of design infrastructure at GLOBALFOUNDRIES. “The new Calibre Pattern Matching product allows us to simplify the specification of advanced DRC and DFM rules, and improve the communication between designers and foundry personnel by moving from a text-based representation of yield-detracting geometries to a pattern-based one. As we all know from personal experience, a picture is worth a thousand words.”
“Our experience over multiple nodes in developing tools that represent the manufacturing process to designers has shown us that success depends on close cooperation among foundry, EDA vendor and design teams,” said Michael Buehler-Garcia, director of marketing for Calibre design-side products at Mentor Graphics. “DRC+ is based on collaboration that tunes our platform to GLOBALFOUNDRIES’ manufacturing process, making it easier and faster for designers to create market-winning ICs on the most advanced processes available.”
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $800 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
For more information, please contact:
| Gene Forte Mentor Graphics 503.685.1193 gene_forte@mentor.com | Sonia Harrison Mentor Graphics 503.685.1165 sonia_harrison@mentor.com |
(Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners)
IC Nanometer Design Press Releases
- Mentor Graphics Pyxis Platform and PDK Automation Process Adopted by MagnaChip Semiconductor (May 14, 2013)
- Mentor Graphics Deep Submicron Division Launches the Kronos Cell Characterization and Analysis Platform (Feb 27, 2013)
- Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung’s 14nm IC Manufacturing Process (Dec 21, 2012)
- Mentor Graphics Pyxis Platform Applauded by HP (Dec 19, 2012)
- Mentor Graphics Announces that ON Semiconductor Completed Multiple Successful Tapeouts Using Pyxis Custom Router (Nov 8, 2012)
- KALRAY Completes 256-processor, 28nm SoC Design Using Mentor Graphics Design and Test Tools (Oct 23, 2012)
- TSMC Presents Two Partner of the Year Awards to Mentor Graphics for 20nm and 3D IC Design Flows (Oct 16, 2012)
- Mentor Graphics Provides Design, Verification and Test Solutions for TSMC’s 20nm Design Infrastructure (Oct 15, 2012)
- Mentor Graphics Provides Design, Verification, Thermal and Test Solutions for TSMC’s CoWoS Reference Flow (Oct 15, 2012)
- Mentor Graphics Calibre LFD Signoff Litho Checking Tool Certified for TSMC 20nm Process (Sep 12, 2012)