WILSONVILLE, Ore., September 12, 2012 -Mentor Graphics Corp. (NASDAQ: MENT) today announced that the Calibre® LFD™ (Litho Friendly Design) signoff lithography checking tool has been certified by TSMC for its 20nm IC manufacturing process.
The Calibre LFD product identifies hotspots and verifies that designs have sufficient process window. Using the tool, problem features that cannot be fixed at the mask stage using optical proximity correction (OPC) can be identified in the design phase and eliminated before tapeout. This helps to avoid litho-related manufacturing issues and late stage delays resulting from re-design. Pre-tapeout litho checking has been an industry best practice since the 40nm and 28nm processes, and it is now further proliferated into the advanced 20nm process.
“We collaborated closely with TSMC from the start of their LPC development project to integrate Calibre LFD with TSMC’s Unified Design For Manufacturing (DFM) engine in order to deliver a robust litho process checking (LPC) simulation flow,” said Joe Kwan, Product Marketing Manager for Calibre LFD and DFM Service at Mentor Graphics. “Fast and accurate litho checking is an essential capability that gives design companies competitive advantages, and Calibre is the tool that the industry relies on to help ensure manufacturability of designs at the leading edge.”
“At 20nm, LPC helps ensure that advanced designs incorporating double patterning can meet DFM requirements and minimize litho-related hotspots,” said Suk Lee, TSMC Senior Director, Design Infrastructure Marketing Division. “We worked closely with Mentor to integrate Calibre LFD with our Unified DFM engine to provide accurate litho checking in a familiar, integrated flow that is fully supported by TSMC’s 20nm DFM Data Kit. ”
(Mentor Graphics and Calibre are registered trademarks and LFD is a trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)