Mentor Graphics CEO to Keynote SBC 2005
WILSONVILLE, Ore., May 6, 2005 - Mentor Graphics Corporation (NASDAQ: MENT) today announced that Walden C. Rhines, the company's chairman and CEO, will keynote the Semiconductor Strategic Business Conference (SBC) 2005 on May 10 at The Resort at the Mountain in Welches, Oregon. Rhines will discuss how design-for-manufacturing (DFM) is fundamentally changing the design/manufacturing partnership to enable faster yield time in the semiconductor industry, as nanometer designs enter the mainstream.
What: Mentor Graphics keynote by Walden C. Rhines, Chairman and CEO, Mentor Graphics Corporation, at SBC.
Topic: Design-for-Manufacturing
When: Tuesday, May 10, 2005, 8:00 - 8:45 a.m. PST
Where: The Resort at the Mountain, 68010 East Fairway Ave., Welches, OR 97067, (503) 622-3101
Website: http://wps2a.semi.org/wps/portal/_pagr/114/_pa.114/
About Mentor Graphics
Mentor Graphics Corporation (Nasdaq: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world's most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $700 million and employs approximately 3,850 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777; Silicon Valley headquarters are located at 1001 Ridder Park Drive, San Jose, California 95131-2314. World Wide Web site: http://www.mentor.com/.
Mentor Graphics is a registered trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.
For more information, please contact:
Suzanne Graham
Mentor Graphics
503.685.7789
suzanne_graham@mentor.com
Barbara Rizzatti
Mentor Graphics
503.685.0443
barbara_rizzatti@mentor.com
IC Nanometer Design Press Releases
- Mentor DFM Analysis Service Delivers Calibre Litho Checks for TSMC 40nm and 28nm Customers (May 24, 2012)
- TowerJazz Finds a Unique Solution for Advanced ESD and Power Domain Checking in Calibre PERC (May 22, 2012)
- SMIC Employs Mentor Graphics Calibre PERC for Reliability Verification of Multi-Power Domain SoCs (May 22, 2012)
- GLOBALFOUNDRIES Improves IC Reliability with Customized Circuit Checks Using Mentor Graphics Calibre PERC (May 22, 2012)
- Calibre Flow Developed with Mentor Graphics Consulting Boosts GLOBALFOUNDRIES Silicon Yield (Mar 8, 2012)
- Samsung DFM Ready for 20 nm Based on Mentor Graphics Calibre Platform (Mar 1, 2012)
- Fujitsu Semiconductor Expands Use of Calibre for Advanced IC Physical Verification and Design for Manufacturing (Jan 23, 2012)
- Mentor Graphics Receives TSMC’s Partner of the Year Award for 3D-IC Design Enablement (Nov 11, 2011)
- Mentor Graphics Announces Completion of 20 nm Test Chip Tapeout with STMicroelectronics Using Olympus-SoC Place and Route System (Nov 4, 2011)
- Mentor Graphics and TSMC Address Advanced Node Fill Requirements Using Calibre SmartFill (Sep 14, 2011)