Through-process modeling in a DfM environment
MoreRequest Techpub
You will receive an email with a direct link to your requested TechPub.
In recent years, design for manufacturability (DFM) has become an
important focus item of the semiconductor industry and many new DfM
applications have arisen. Most of these applications rely heavily on the
ability to model process sensitivity and here we explore the role of
through-process modeling on DfM applications. Several different DfM
applications are examined and their lithography model requirements
analyzed. The complexities of creating through-process models are then
explored and methods to ensure their accuracy presented.
You will receive an email with a direct link to your requested TechPub.
It's free, will only take a minute, and will improve your experience on mentor.com.
1-800-547-3000 © Mentor Graphics, All rights reserved.
Site Map | Partners and Foundry Support | Contact Us | Terms and Conditions | Privacy Policy | International Websites