An Evolution of Gate and Via Parasitic Resistance Extraction
Mastering the Magic of Multi-Patterning
Multi-patterning technology was introduced at the 20 nm node to overcome lithographic limitations in current IC manufacturing processes. While processes like double and triple patterning may sometimes seem...
How to run multi-power domain checking using Calibre PERC
In the mix signal design, it is required to have different voltages to support each domain on the chip. However, designers have to make sure there is no signal line directly across from one voltage to another...