Calibre Pattern Matching
Calibre® Pattern Matching replaces lengthy and multi-operational text-based design rules with an automated visual geometry capture and compare process that significantly reduces rule deck size and improves congruence between the original intent of the design specification and its implementation.
Using Calibre Pattern Matching not only enables you to implement today’s complex design constraints, but it also ensures uniformity and streamlined communication between design, manufacturing and test teams.
Calibre Pattern Matching Overview
Technology Overview Calibre Pattern Matching provides interactive and automated pattern capture, definition, and search that can be used across implementation, verification, and test flows.
Features and Benefits
Calibre Pattern Matching Features
- Automated pattern capture via a familiar GUI or batch scripting environment
- Specify exact match or add controlled variability with pattern constraints
- Use with multiple Calibre tools as part of a single SVRF deck
- Run in all major design environments using existing Calibre nmDRC integrations
Precise rule checks, smaller rule decks
With Calibre Pattern Matching, you can quickly and accurately implement complex design constraints and rule checks that are difficult or impossible to define using text-based scripting, while significantly reducing rule deck size.
Easy to Use
Pattern creation is easy with Calibre Pattern Matching. Designers can draw a pattern using Calibre DESIGNrev or Calibre Workbench, then specify an exact match or controlled pattern variability. Alternatively, using existing Calibre nmDRC/LFD error markers, designers can use Calibre Pattern Matching’s automated flow to capture hundreds or thousands of patterns all in one step.
Shared pattern libraries between design, manufacturing and test ensure consistency and accuracy across flows and between teams. With Calibre Pattern Matching, you can easily provide fast, accurate updates for recently-identified yield-limiting patterns, making the entire implementation and verification process faster and more efficient.
Calibre Signoff Quality
Calibre Pattern Matching is integrated with Olympus-SoC and Calibre InRoute to provide Calibre signoff quality auto-fixing and verification during implementation. Calibre Pattern Matching can also be used in conjunction with Calibre nmDRC/eqDRC in all major P&R and custom design environments for Calibre signoff quality verification.
Develop rule decks faster, even at the most advanced nodes, while ensuring precise compliance with the most complex engineering specifications.
Complex Verification Simplified
At 45 nm and below, design constraints have become a complex, interdependent, multi-dimensional set of variables. Lithography restrictions and physical manufacturing limitations create an ever-expanding set of design requirements, leading to a explosion in rule deck size and complexity. Where simple one-dimensional checks were once sufficient, multi-dimensional checks that examine the interrelationship of multiple geometries over long ranges are now essential to ensure manufacturability. Even at mature design nodes like 90 nm and above, AMS and RF applications often have design considerations that are difficult to implement in text-based design rules. This upsurge in complexity means many desired advanced DRC checks are difficult (if not nearly impossible) to accurately code. The increase in deck size and complexity also results in increased verification runtimes and longer debug times.
Calibre Pattern Matching provides interactive and automated pattern capture, definition, and search that can be used across implementation, verification, and test flows. Pattern matching replaces complex and lengthy text-based design rule checks containing 10s to 100s of operations with a single visual geometry that provides a precise and accurate point of congruence between the original intent of the design specification and its implementation as a design rule check.
Calibre Pattern Matching enables the creation of physical verification (PV) or design methodology checks that were previously difficult or operationally impossible to create—enabling designers to deliver higher-performing products with reduced design variability, even at the most advanced nodes.
Automated Pattern Capture, Definition and Search
With Calibre Pattern Matching, designers can create patterns manually or use the automated pattern capture to create multiple patterns in a single step. Pattern libraries can be created for design methodologies, manufacturing processes, or other categorizations, as applicable.
When invoked, the pattern matching engine scans the design to find matches. A marker is placed at the site of every pattern match. Flexible marker definitions enable the use of different markers for different layers, and provide a range of user-defined markers to enable the definition and use of markers appropriate to a specific process (e.g., markers used for DRC runs can be defined to look like regular DRC results, and can be debugged in exactly the same way). Because pattern matching is a direct visual comparison between actual geometries, accuracy and precision are increased, and debugging is greatly simplified.
Foundries or IDMs know there are certain shapes that are “sensitive” to a particular process. Fabless/fablite companies have design methodology guidelines that they perform on top of the sign-off Calibre nmDRC deck received from the manufacturer. Both groups can more quickly, easily, and accurately capture advanced checks using pattern matching compared to traditional text-based approaches. Because Calibre Pattern Matching can be performed within a standard Calibre nmDRC run, they have the flexibility to perform traditional DRC checks, then pattern matching, followed by more DRC operations, all as part of one run—no streaming in and out, no complex flows.
Calibre Design Platform and Flow Integration
Calibre Pattern Matching is built on and integrated into the Calibre nm Platform, so it can be used with multiple Calibre tools as part of a single SVRF deck—no stream-outs/stream-ins or complex scripts needed. Integration with Olympus SoC and Calibre InRoute allows you to perform pattern matching-driven place and route with auto-fixing and verification that meet Calibre signoff quality standards. This direct integration enhances performance and reduces turnaround times for even the most complex and advanced designs. To ensure consistency, pattern libraries can be shared between Olympus SoC, Calibre InRoute, Calibre nmDRC, and Calibre LFD (litho-friendly design).
Design Environment Integration
Calibre nmDRC’s integrations with all major design creation environments means you can run Calibre Pattern Matching anywhere you run Calibre nmDRC. Design teams not using Olympus-SoC or Calibre InRoute can invoke Calibre nmDRC with Calibre Pattern Matching from another P&R tool or design tool. Results can be debugged in any design environment used to debug Calibre nmDRC results.
Combining Calibre nmDRC’s breadth of integrations with the simplicity of pattern creation makes Calibre Pattern Matching a game changer for streamlining communication from manufacturing and design methodology teams to design implementation and verification groups. For example, teams can receive accurate, quick updates for recently found yield limiting patterns with a level of simplicity not possible with traditional flows. Faster, more accurate communication using actual patterns (rather than text-based abstractions) makes the entire implementation and verification process faster and more efficient.
More Calibre Pattern Matching
What They're Saying
“With DRC+ (Pattern Matching), we are improving upon the traditional approach and giving customers increased visibility into potential manufacturability issues, earlier in the design flow.”
“The new Calibre Pattern Matching product allows us to simplify the specification of advanced DRC and DFM rules, and improve the communication between designers and foundry personnel by moving from a text-based representation of yield-detracting geometries to a pattern-based one. As we all know from personal experience, a picture is worth a thousand words.”
“As TSMC customers move to 28nm and beyond, they want tools that allow them to work at higher levels of abstraction, and give them confidence that their designs can meet performance and low power goals and achieve yields that TSMC processes are capable of delivering. The Mentor Reference Flow 11.0 track meets those requirements.”