Foundry Solutions Video Blog: TSMC OIP Conference

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Michael Buehler at DAC 2012

Interview with Mentor Graphics' Michael Buehler at DAC 2012.…View Technology Overview

David Abercrombie at DAC 2012

Interview with Mentor Graphics' David Abercrombie at DAC 2012.…View Technology Overview

Walden Rhines at DAC 2012

Interview with Mentor Graphics CEO Walden Rhines at DAC 2012.…View Technology Overview

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Aerial Image Retargeting (AIR): Achieving Litho-Friendly Designs

White Paper: In this work, we present a new technique to detect non-Litho-Friendly design areas based on their Aerial Image signature. The aerial image is calculated for the litho target (pre-OPC). This is followed...…View White Paper

Fast Process-Hotspot Detection Using Compressed Patterns

White Paper: This paper presents an approach for compressing litho hotspot pattern library that complies with general purpose pattern matching engine. This approach incorporates two techniques to achieve optimal pattern...…View White Paper

Double Patterning from Design Enablement to Verification

White Paper: Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges...…View White Paper